Applied Materials Introduces Critical Ion Implant Technology for Scaling Future Chips
(Thomson Reuters ONE) -
* New Applied Varian VIISta(®) Trident system delivers precise dose and angle
control needed for advanced transistor structures
* Already tool of record at all major foundries for 20nm technology node
SANTA CLARA, Calif., June 6, 2012 - Applied Materials, Inc. today announced its
new Applied Varian VIISta(®) Trident system, the semiconductor industry's most
advanced single-wafer, high-current ion implant system. Used to engineer the
electrical characteristics of the chip by embedding "dopant" atoms, the new
VIISta Trident system is the only ion implanter proven to achieve the yields
necessary for manufacturing high-performance, power-efficient logic chips at the
20nm node.
At the 20nm node, optimizing dopant activation and suppressing defects in the
extension, source/drain junction and contact regions become significant
challenges that impede the scaling of high performance transistors. The unique
capability of the VIISta Trident system to precisely tailor dopant concentration
and depth profile is critical to optimizing performance, controlling leakage
current and reducing variability in advanced devices.
"A typical advanced logic chip requires as many as 60 implant steps, including
co-implant and precision materials modification applications - many of which are
critical to device performance. The precision of our VIISta Trident technology
is vital to helping our customers achieve profitable yields on their leading-
edge designs," said Bob Halliday, vice president and general manager of
Applied's Varian business unit. "This benchmark performance strengthens
Applied's leadership position in providing our customers with leading-edge
transistor fabrication solutions. All major foundries fabricating 20nm chips
today are using our VIISta Trident systems as tool of record."
Key to the superior performance of the Trident system is its proprietary dual-
magnet ribbon beam architecture for enhanced low energy performance. The
system's Energy Purity Module virtually eliminates damaging, high-energy species
that can "smear" the critical transistor channel and lead to increased current
leakage and degraded performance.
Integrated cryogenic technology enables production implants as low as -100°C,
providing superior process control for transistor matching. This is particularly
vital for making embedded SRAM cells for on-chip cache memory, where the six or
eight transistors that make up each cell must be precisely matched to enable
reliable switching at the low operating voltages required for mobile computing.
To learn more about the technology behind Applied's Varian VIISta Trident
system, visit www.appliedmaterials.com/technologies/library/varian-viista-
trident.
The Trident system is one of several important technologies being announced by
Applied in connection with SEMICON West 2012 - to be held on July 10-12 in San
Francisco, Calif. More information can be found at Applied's online booth at
http://www.appliedmaterials.com/becauseinnovationmatters, which will be updated
regularly before and during the show.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing
innovative equipment, services and software to enable the manufacture of
advanced semiconductor, flat panel display and solar photovoltaic products. Our
technologies help make innovations like smartphones, flat screen TVs and solar
panels more affordable and accessible to consumers and businesses around the
world. At Applied Materials, we turn today's innovations into the industries of
tomorrow. Learn more at www.appliedmaterials.com.
# # #
Contact:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
The Applied Varian VIISta Trident ion implantation system:
http://hugin.info/143724/R/1617558/516197.jpg
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Source: Applied Materials via Thomson Reuters ONE
[HUG#1617558]
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Datum: 06.06.2012 - 13:31 Uhr
Sprache: Deutsch
News-ID 153787
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