Applied Materials Introduces Breakthrough Etch Technology for the Terabit Era
(Thomson Reuters ONE) -
* Applied Centura Avatar system overcomes challenges to etching new 3D NAND
Flash chips
* Etches 80:1 aspect ratio features, as well as structures with greatly
varying depths, in a single process
* More than 30 chambers already shipped to customers
SANTA CLARA, Calif., June 27, 2012 - Applied Materials, Inc. today advanced the
state of the art in etch technology with the launch of the Applied Centura(®)
Avatar(TM) dielectric etch system. This breakthrough system is designed to solve
one of the most demanding challenges in creating the three-dimensional (3D)
memory architectures that deliver the high-density, terabit storage capability
required for tomorrow's data-intensive mobile devices.
"With the Avatar system, we've capitalized on our leadership in plasma
technology to address the unmet challenges of fabricating three-dimensional
memory structures that require the etching of deep features in complex multi-
layer material stacks," said Dr. Prabu Raja, vice president and general manager
of Applied's Etch business group. "Customers are very enthusiastic about the
breakthrough capabilities of this new system. We have already shipped more than
30 chambers to multiple customers for critical applications including the pilot
production of future chips."
Newly designed from the ground up, the Avatar system etches the deep, narrow
features that are a hallmark of 3D NAND memory arrays. These 3D arrays represent
an exciting new type of Flash device in which as many as 64 layers of memory
cells are built up vertically to create extraordinary bit density in a small
area.
The Avatar system can etch holes and trenches in complex film stacks with depth
to width aspect ratios of up to 80:1. To illustrate this proportion, the aspect
ratio of the Washington Monument is just 10:1. In addition, the system enables
the simultaneous and precise etching of features with greatly varying depths -
which is critical to fabricating the "staircase" contact structures that connect
each layer of memory cells to the outside world.
The Avatar system is one of several new chipmaking technologies that will be
showcased by Applied at SEMICON West 2012 to be held July 10-12. Find out more
about opportunities to connect with Applied before and during the show at
www.appliedmaterials.com/semicon-west-2012.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing
innovative equipment, services and software to enable the manufacture of
advanced semiconductor, flat panel display and solar photovoltaic products. Our
technologies help make innovations like smartphones, flat screen TVs and solar
panels more affordable and accessible to consumers and businesses around the
world. At Applied Materials, we turn today's innovations into the industries of
tomorrow. Learn more at www.appliedmaterials.com.
# # #
Contact:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
Photo: The Applied Centura Avatar Dielectric Etch System:
http://hugin.info/143724/R/1622265/518469.jpg
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Source: Applied Materials via Thomson Reuters ONE
[HUG#1622265]
Unternehmensinformation / Kurzprofil:
Datum: 27.06.2012 - 13:31 Uhr
Sprache: Deutsch
News-ID 160567
Anzahl Zeichen: 3964
contact information:
Town:
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Kategorie:
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