“Plasma Etching & Deposition” Seminar in China enjoyed great popularity
A one day technical plasma seminar was given by SENTECH in Shanghai on June 20th, 2014. The Chinese institute SIMIT (Shanghai Institute of Microsystem and Information Technology) hosted this annual event, which gained the attention of many students, scientists and experts from industry, like it had the previous years.
(firmenpresse) - More than 60 participants have joined this informative one day event, which contained advanced information about plasma etching & deposition with a focus on new trends in plasma etching, PECVD and ALD.
Expert speakers from SENTECH and from scientific organizations in China focussed on recent plasma process topics like deep silicon plasma etching processes and applications. Furthermore, ICP plasma etching of III-V compounds and in situ ellipsometry for ALD systems were covered. The technical program of this free of charge seminar was set up to stimulate customers´ interests in SENTECH´s recent technical advances and to support plasma users in their practical work. Between the presentations lively discussions about specific technical details as well as the suitability of ICP processes for creating solutions to future application challenges came up. Special interest was on ICP plasma deposition at low temperatures for temperature sensitive substrates. SENTECH was glad to underline that high quality ICPECVD film deposition temperatures lower than 130° C are feasible with our ICP plasma deposition tools.
Evaluating the participants’ feedback confirmed the positive impressions that the SENTECH presenters had experienced during the event. There was a very positive feedback to context and standard of all presentations. This stimulates SENTECH to continue organizing workshops and events around plasma etching and deposition topics. “Hence SENTECH is planning to institutionalize more of those workshops on plasma topics on a regular basis” Mr Gruska, CMO of SENTECH Instruments reveals. If you want to learn more about SENTECH plasma etching and PECVD Seminars contact us!
Themen in dieser Pressemitteilung:
plasma-ecthing
plasma-etcher
plasma-deposition
pecvd
pecvd-deposition
pecvd-process
plasma-etching-of-aluminium
plasma-etch
icp-etching
Unternehmensinformation / Kurzprofil:
SENTECH Instruments develops, manufactures, and sells worldwide advanced quality instrumentation for Plasma Process Technology, Thin Film Measurement, and Photovoltaics.
SENTECH plasma etchers and deposition systems including ALD support leading-edge applications. They feature high flexibility, reliability, and low cost of ownership. SENTECH’s plasma products are developed and manufactured in-house and thus allow for customer-specific adaptations. More than 300 units have been sold to research facilities and industry for applications in nanotechnology, micro-optics, and optoelectronics.
SENTECH offers a broad range of spectroscopic ellipsometers, laser ellipsometers, and reflectometers for the measurement of thickness and optical constants on thin films and layer stacks. By selling more than 1,500 measurement units, SENTECH has become one of the world leaders in thin film metrology. It is especially successful in photovoltaics with measurement solutions for the development and manufacturing of crystalline silicon and thin film solar cells.
SENTECH Instruments effectively serves a worldwide customer base and is well established in future technology markets. A global distribution network of 20 experienced and highly qualified partners plus SENTECH’s own service office in Asia provide quick and efficient customer service. Best application support is given by SENTECH’s application experts who operate in application laboratories for thin film measurement and plasma process technology that cover an area of more than 150 m2.
Datum: 04.07.2014 - 10:46 Uhr
Sprache: Deutsch
News-ID 333710
Anzahl Zeichen: 2028
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: +49 30 63 92 55 20
Kategorie:
Semiconductors
Typ of Press Release: Unternehmensinformation
type of sending: Veröffentlichung
Date of sending: 04.07.2014
Diese Pressemitteilung wurde bisher 399 mal aufgerufen.
Die Pressemitteilung mit dem Titel:
"“Plasma Etching & Deposition” Seminar in China enjoyed great popularity "
steht unter der journalistisch-redaktionellen Verantwortung von
SENTECH Instruments GmbH (Nachricht senden)
Beachten Sie bitte die weiteren Informationen zum Haftungsauschluß (gemäß TMG - TeleMedianGesetz) und dem Datenschutz (gemäß der DSGVO).
