SIPAR: New system for PEALD & ICPECVD in one reactor presented at ThGOT
SENTECH offers leading edge plasma process technology equipment for etching and deposition, as well as thin film measurement instrumentation. We proudly presented our new combinatorial system “SIPAR” for PEALD & IC PECVD at the ThGOT conference (Thuringian surface days).
(firmenpresse) - At the ThGOT SENTECH presented the innovative system “SIPAR”, which combines PECVD and PEALD technique in one reactor for depositing moisture barriers. The SIPAR complements the wide ranging SENTECH product portfolio with an innovative alternative to cluster systems. In contrast to conventional cluster systems this smart IC PECVD and PEALD combination offers a cost effective solution for the needs of industry and R&D. Combining advantages of SENTECH PEALD, which features excellent conformity and homogeneity, and IC PECVD for high deposition rates at lowest temperatures, the deposition of hybrid multilayer moisture barriers in one reactor is facilitated. Due to the fact that no handling is necessary, processing time will be saved and contamination will be prevented.
The ThGOT has been taking place from 2. untill 4. of September in Leipzig, Germany. It was the 10th anniversary of this popular conference and many visitors from industry and science attended the various presentations and poster sessions. SENTECH participated on the event with a booth as well as with introducing the newly developed combinatorial system for PEALD and IC PECVD “SIPAR” for depositing moisture barriers.
“The interest in ALD has grown enormously in the last years, this can be seen from the increasing number of presentations on the topic at ThGOT” Dr Gargouri, one of SENTECH`s plasma specialists resumes. If you are interested in more details of our new IC PECVD & PEALD system SIPAR, please contact us!
Themen in dieser Pressemitteilung:
semiconductor
semiconductors
products-semiconductor
plasma
plasma-etching
plasma-etcher
plasma-deposition
pecvd
icpecvd
atomic-layer-deposition
ald
cluster-configuration
rie-etching
Unternehmensinformation / Kurzprofil:
SENTECH Instruments develops, manufactures, and sells worldwide advanced quality instrumentation for Plasma Process Technology, Thin Film Measurement, and Photovoltaics.
Datum: 28.10.2014 - 11:27 Uhr
Sprache: Deutsch
News-ID 347336
Anzahl Zeichen: 1811
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: +49 30 63 92 55 20
Kategorie:
Tradeshows
Typ of Press Release: Unternehmensinformation
type of sending: Veröffentlichung
Date of sending: 28.10.2014
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"SIPAR: New system for PEALD & ICPECVD in one reactor presented at ThGOT"
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