SENTECH presents new ALD Real Time Monitor at SEMICON Europa
With more than 6000 visitors the SEMICON Europa 2014 was the ideal place to introduce SENTECH’s latest development on the field of atomic layer deposition (ALD) – the new ALD Real Time Monitor.
(firmenpresse) - The ALD Real Time Monitor is an insitu measurement tool for adsorption and desorption processes during ALD cycles with millisecond time resolution. The innovative ALD Real Time Monitor is especially designed for fast and efficient process optimization. Additionally, monitoring the film thickness growth the tool is used for end point detection.
The presentation of SENTECH ALD Real Time Monitor drew attention to the newly launched insitu measurement tool and contributed to a successful SEMICON Europa 2014. We are looking forward to the upcoming SEMICON Europa 2015 taking place in Dresden, Germany.
Themen in dieser Pressemitteilung:
atomic-layer-depostion
ald
etching
plasma-etching
plasma-depostion
thin-film
thin-film-technology
thin-film-measurement
Unternehmensinformation / Kurzprofil:
SENTECH offers leading edge plasma process technology equipment for etching and deposition, Atomic layer deposition, as well as thin film measurement instrumentation.
Datum: 14.11.2014 - 11:47 Uhr
Sprache: Deutsch
News-ID 352648
Anzahl Zeichen: 811
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: 030 63 92 55 20
Kategorie:
Semiconductors
Typ of Press Release: Messeinformation
type of sending: Veröffentlichung
Date of sending: 14.11.2014
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"SENTECH presents new ALD Real Time Monitor at SEMICON Europa "
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SENTECH Instruments GmbH (Nachricht senden)
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