SENTECH Seminar on “Plasma Process Technology”
SENTECH organizes a application oriented Seminar on plasma process technology at March 5th, 2015 in Berlin, Adlershof.
(firmenpresse) - SENTECH Seminar on “Plasma Process Technology” focusses on application of ICPECVD, PEALD, RIE, DRIE and cryogenic etching by SENTECH plasma systems. Hot topics are the deposition of thin silicon films for TFT manufacturing, the deposition of very thin PEALD layers for organic electronics, and etching of indium phosphide, of sapphire, and gallium nitride for microelectronics. Please download the full program here: Program SENTECH Plasma Seminar.
SENTECH is going to introduce innovations like the SIPAR system combining PEALD and ICPECVD in one reactor and the new ALD Real Time Monitor for high-resolution in situ monitoring.
After the SENTECH Seminar participants are invited to visit SENTECH application laboratories and production facilities. We are looking forward to welcome you at SENTECH!
The SENTECH Seminar on “Plasma Process Technology” takes place at SENTECH Instruments, Schwarzschildstraße 2, Berlin Adlershof, on Thursday, March 05th, 2015. Please register for the SENTECH Plasma Seminar at our homepage using the registration form.
For further information please call: +49 89 8979607-0
Themen in dieser Pressemitteilung:
plasma-seminar
seminar-on-plasma-etching
seminar-plasma-etching
seminar-pecvd
pecvd
seminar-ald
seminar-atomic-layer-deposition
ald
atomic-layer-deposition
Unternehmensinformation / Kurzprofil:
SENTECH Instruments develops, manufactures, and sells worldwide advanced quality instrumentation for Plasma Process Technology, Thin Film Measurement, Atomic Layer Deposition, and Photovoltaics.
SENTECH plasma etchers and deposition systems including ALD support leading-edge applications. They feature high flexibility, reliability, and low cost of ownership. SENTECH’s plasma products are developed and manufactured in-house and thus allow for customer-specific adaptations. More than 300 units have been sold to research facilities and industry for applications in nanotechnology, micro-optics, and optoelectronics.
Datum: 02.02.2015 - 10:20 Uhr
Sprache: Deutsch
News-ID 368324
Anzahl Zeichen: 1261
contact information:
Contact person: Pia Romanowski
Town:
Berlin
Phone: +49 30 63 92 55 20
Kategorie:
Semiconductors
Typ of Press Release: Unternehmensinformation
type of sending: Veröffentlichung
Date of sending: 02.02.2015
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