Entegris Announces New Post-CMP Cleaning Solutions for Advanced Semiconductor Manufacturing
(Thomson Reuters ONE) -
PlanarClean® AG Products Are Optimized for Copper and Tungsten Processes at 10
nm and Below
BILLERICA, Mass., Jan. 26, 2016 (GLOBE NEWSWIRE) -- Entegris, Inc.
(NASDAQ:ENTG), a leader in yield-enhancing materials and solutions for highly
advanced manufacturing environments, today announced new post-chemical
mechanical planarization (post-CMP) cleaning solutions for semiconductor
manufacturing. The new PlanarClean(®) AG family of products were designed for
use in 10 nm processes and below, and add to Entegris' leading portfolio of
post-CMP cleaning solutions.
"Entegris has been the industry leader in post-CMP cleaning for many years. Our
PlanarClean family products have been widely used in wafer fabs around the
world. To address greater complexity of wafer production at the leading-edge
nodes due to the addition of many new materials, such as cobalt and tungsten, we
carefully re-formulated our PlanarClean solution to provide superior cleaning
without damaging advanced films or new materials," said Cuong Tran, director of
post-CMP cleans for Entegris. "PlanarClean AG meets the needs for advanced
processes, while also conforming to new safety guidelines outlined by our
customers."
The CMP process in silicon wafer production consists of a mechanical polishing
step which utilizes a chemical slurry formulation to remove unwanted conductive
or dielectric materials from the surface of the integrated device, achieving a
flat and smooth surface upon which additional layers of integrated circuitry are
built. The post-CMP cleaning step removes nanoparticles to minimize potential
wafer defects while maintaining the integrity of the layers of materials already
in place.
Changes to the number and types of films and materials exposed during cleaning
in advanced processes have highlighted a need for specifically formulated
cleans. In addition, changes to the particles used in slurries have rendered
many of the traditional post-CMP cleaners ineffective and inefficient for
leading-edge technologies, specifically in Front-End-of-Line (FEOL) processes.
These challenges are now pushing semiconductor manufacturers to consider
formulated cleans over commodity cleans.
PlanarClean AG formulated solutions meet these needs by providing one-step,
superior cleaning in advanced processes that include copper, cobalt and
tungsten, while protecting the underlying thin films and materials. Its
proprietary formulation offers increased performance through enhanced
reliability and yield, low to zero corrosion and defects and increased queue
time. In addition, PlanarClean AG provides a cost-of-ownership advantage by
reducing the amount of chemistry required in the cleaning step, and meets the
latest EHS safety requirements for fab chemistries. The products have been
successfully evaluated in multiple leading-edge fabs and are currently available
to all customers.
For more information, please visit the Entegris booth at SEMICON(®) Korea, Hall
D, Booth #5612, through Friday, January, 29(th), or contact your local Entegris
representative or visitwww.entegris.com.
About Entegris
Entegris is a leading provider of a wide range of products for purifying,
protecting, and transporting critical materials used in processing and
manufacturing in the semiconductor and other high-tech industries. Entegris is
ISO-9001 certified and has manufacturing, customer service and/or research
facilities in the United States, China, France, Germany, Israel, Japan,
Malaysia, Singapore, South Korea and Taiwan. Additional information may be
found at www.entegris.com.
Entegris(®), Entegris Rings Design(®), Creating a Material Advantage(®) and
PlanarClean(®) are all trademarks of Entegris, Inc. SEMICON(®) is a trademark of
Semiconductor Equipment and Materials International Corporation.
Company Contact:
Andrew DePoy
Brand & Marcom Mgr.
T +1 480 290 8748
andrew.depoy(at)entegris.com
Media Contact:
Lora Martinez
Impress Labs
303.941.6110
lora(at)impresslabs.com
This announcement is distributed by GlobeNewswire on behalf of
GlobeNewswire clients. The owner of this announcement warrants that:
(i) the releases contained herein are protected by copyright and
other applicable laws; and
(ii) they are solely responsible for the content, accuracy and
originality of the information contained therein.
Source: Entegris, Inc. via GlobeNewswire
[HUG#1981395]
Datum: 26.01.2016 - 16:39 Uhr
Sprache: Deutsch
News-ID 446645
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Kategorie:
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