SENTECH Seminar on “Plasma Process Technology” 2016

SENTECH Seminar on “Plasma Process Technology” focusses on applications of ICPECVD, PEALD, RIE, DRIE and cryogenic etching by SENTECH plasma systems. Hot topics are the highly uniform deposition of SiN-layers by ICPECVD, the deposition of thick multilayer coating with PEALD for X-ray optics, and ICP-RIE etching of technical glasses. Please download the full program at our website.

(firmenpresse) - SENTECH is going to present low temperature ICPECVD using liquid precursors as an alternative to silane-based processing. PEALD using the true remote plasma source will be compared to PEALD with the PTSA ICP plasma source.

After the SENTECH Seminar participants are invited to visit SENTECH application laboratories and production facilities. The innovative ALD Real Time Monitor will demonstrate high resolution in situ process monitoring. We are looking forward to welcome you at SENTECH!

The SENTECH Seminar on “Plasma Process Technology” takes place at SENTECH Instruments, Schwarzschildstraße 2, Berlin Adlershof, on Thursday, April 07th, 2016. Please register for the SENTECH Plasma Seminar at sales(at)sentech.de using the registration form .

For further information please contact us or call: +49 89 8979607-0

Weitere Infos zu dieser Pressemeldung:

Themen in dieser Pressemitteilung:


Unternehmensinformation / Kurzprofil:
Bereitgestellt von Benutzer: SentechPia
Datum: 22.02.2016 - 14:02 Uhr
Sprache: Deutsch
News-ID 452161
Anzahl Zeichen: 1250

contact information:
Contact person: P. Romanowski
Town:

Berlin

Phone: +49 30 63 92 5628

Kategorie:

Business News

Typ of Press Release: Unternehmensinformation
type of sending: Veröffentlichung
Date of sending: 22.02.2016

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