DGAP-News: Roth&Rau AG: 21% efficiency rate achieved on 156 mm wafer using Roth&Rau's new high-efficiency technology
(firmenpresse) - DGAP-News: Roth&Rau AG / Key word(s): Miscellaneous
Roth&Rau AG: 21% efficiency rate achieved on 156 mm wafer using Roth&Rau's new high-efficiency technology
05.12.2011 / 12:00
---------------------------------------------------------------------
21% efficiency rate achieved on 156 mm wafer using Roth&Rau's new
high-efficiency technology
Hohenstein-Ernstthal/Neuchâtel, 5 December 2011 - By achieving an
efficiency rate of 21%, Roth&Rau AG has reached a new milestone in the
development of its high-efficiency technology. Solar cells based on
heterojunction technology (HJT) are characterised in particular by their
high output efficiency rates. Moreover, the low temperature coefficient
means that they achieve a higher energy yield. At an output efficiency rate
of 20%, this technology thus already reduces solar electricity generation
costs by around 15% compared with the latest technology available for
traditional crystalline solar cells.
Roth&Rau already presented the world's first heterojunction solar cells
with efficiency rates of 20% produced on industrial 156 mm mono-crystalline
wafers at the 26th European Photovoltaic Solar Energy Conference and
Exhibition (EUPVSEC) held in Hamburg at the beginning of September 2011.
These cell results have since been verified by the Fraunhofer Institute for
Solar Energy Systems (ISE) and further progress has been made at Roth&Rau's research line in Neuchâtel in close cooperation with the EPFL/IMT
research institute located there. The latest results for 156 mm cells now
correspond to a superb rate of 21%.
'With our current results, we have taken a further step towards achieving
grid parity. It is now clear that very high cell efficiency rates are
achievable with heterojunction technology. Now it is a question of
transferring these results to mass production systems', commented Dr.
Egbert Vetter, Vice President for R&D at Roth&Rau AG, with regard to the
latest progress. At its Technology Centre in Hohenstein-Ernstthal, Roth&Rau is pressing ahead with its efforts to transfer the results of the cell
technology development work in Neuchâtel to mass production systems. Using
the HELiA coating systems, which represent the core components of a
production line for solar cells based on heterojunction technology, the
company has currently achieved cell efficiencies of 20%.
Given the great progress made in recent months, Roth&Rau is confident
that the results now achieved will also be available for use in mass
production in the near future.
About Roth&Rau AG:
Roth&Rau AG, based in Hohenstein-Ernstthal, has been one of the world's
leading suppliers of production equipment and innovative production
technologies for the photovoltaics industry for more than 10 years now. In
its photovoltaics segment, Roth&Rau focuses on providing antireflective
coating systems and a variety of advisory and technology transfer services
for the installation of complete production lines for use in the
manufacture of crystalline silicon solar cells. Further products include
thermal processing systems also used in the manufacture of crystalline
silicon solar cells, as well as coating systems and technological support
for the manufacture of thin film solar modules. Roth&Rau MicroSystems, a
subsidiary located in the Wüstenbrand district, develops and produces
process systems for plasma and ion beam enhanced thin film and surface
processing methods tailored to customers' specific needs. The customers
served by this division particularly include companies in the semiconductor
industry, R&D departments in various other industrial sectors, research
institutes and universities. The portfolio of the Roth&Rau Group is
supplemented by software products in the field of systems management,
production monitoring and maintenance and service offerings.?Contact:
Roth&Rau AG
Dr. Silvia Roth
Tel.: +49 (0) 3723/671-3333
E-mail: investor(at)roth-rau.de
End of Corporate News
---------------------------------------------------------------------
05.12.2011 Dissemination of a Corporate News, transmitted by DGAP - a
company of EquityStory AG.
The issuer is solely responsible for the content of this announcement.
DGAP's Distribution Services include Regulatory Announcements,
Financial/Corporate News and Press Releases.
Media archive at www.dgap-medientreff.de and www.dgap.de
---------------------------------------------------------------------
Language: English
Company: Roth&Rau AG
An der Baumschule 6-8
09337 Hohenstein-Ernstthal
Germany
Phone: 03723 6685-0
Fax: 03723 6685-100
E-mail: info(at)roth-rau.de
Internet: www.roth-rau.de
ISIN: DE000A0JCZ51
WKN: A0JCZ5
Listed: Regulierter Markt in Frankfurt (Prime Standard);
Freiverkehr in Berlin, Düsseldorf, München, Stuttgart
End of News DGAP News-Service
---------------------------------------------------------------------
148634 05.12.2011
Themen in dieser Pressemitteilung:
rothrau-ag-21-efficiency-rate-achieved-on-156-mm-wafer-using-rothrau-s-new-high
efficiency-technology
Unternehmensinformation / Kurzprofil:
Datum: 05.12.2011 - 12:00 Uhr
Sprache: Deutsch
News-ID 93768
Anzahl Zeichen: 3609
contact information:
Kategorie:
Business News
Diese Pressemitteilung wurde bisher 333 mal aufgerufen.
Die Pressemitteilung mit dem Titel:
"DGAP-News: Roth&Rau AG: 21% efficiency rate achieved on 156 mm wafer using Roth&Rau's new high-efficiency technology"
steht unter der journalistisch-redaktionellen Verantwortung von
Roth&Rau AG (Nachricht senden)
Beachten Sie bitte die weiteren Informationen zum Haftungsauschluß (gemäß TMG - TeleMedianGesetz) und dem Datenschutz (gemäß der DSGVO).
