Applied Materials Announces First Fully-Autonomous Defect Review SEM for Leading-Edge Chip Production
(Thomson Reuters ONE) -
* SEMVision G5 system brings breakthrough "hands-free" capability to
semiconductor manufacturing
* Superior image quality enabled by unmatched 1nm pixel size
* Delivers highest rate of relevant defects in critical 22nm patterning layers
for rapid yield ramp
SANTA CLARA, Calif., December 5, 2011 - Applied Materials, Inc. today extends
its leadership in defect review SEM* technology with the launch of its Applied
SEMVision(TM) G5 system - the first tool that enables chipmakers to image and
analyze 20nm yield-limiting defects in a production environment without manual
intervention. Uniquely capable of identifying and imaging relevant defects with
1nm pixel size, the SEMVision G5 system allows logic and memory customers to
streamline manufacturing, pinpointing the root cause of defects faster and more
accurately than ever before.
The system's best-in-class 1nm pixel size, unmatched image quality and powerful
analysis engine make the SEMVision G5 system the only DR-SEM* capable of
identifying, analyzing and finding defects in the most challenging patterning
layers while also increasing throughput. In addition, the system sets new
benchmarks in separating real from false alarm, or nuisance defects. In tests,
the system was both more accurate and vastly quicker than an expert human
operator, enabling customers to inspect more wafers more often, accelerating
cycles of learning and accelerating yield ramp rates.
The breakthrough SEMVision G5 system is an open architecture platform that
dynamically combines data received from a wafer inspection system with a library
of predefined review strategies. The system automatically creates new review
recipes - a major benefit over competing tools that require time-consuming
manual recipe creation for every chip type to be inspected. This feature is
critical for foundry customers that must rapidly achieve good yield in the
thousands of new chip designs they manufacture each year.
"The excellent imaging capabilities and hands-free approach of the SEMVision G5
system can give our customers a competitive edge by helping them reduce time-to-
market - which is essential to achieving the short product cycles demanded by
today's fast-paced electronics industry," said Itai Rosenfeld, corporate vice
president and general manager of Applied's Process Diagnostics and Control
business unit. "We've already shipped multiple SEMVision G5 systems to
customers, including repeat orders. This rapid adoption demonstrates the value
of the product and continues our thirteen-year leadership in this key chipmaking
technology."
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in providing
innovative equipment, services and software to enable the manufacture of
advanced semiconductor, flat panel display and solar photovoltaic products. Our
technologies help make innovations like smartphones, flat screen TVs and solar
panels more affordable and accessible to consumers and businesses around the
world. At Applied Materials, we turn today's innovations into the industries of
tomorrow. Learn more at www.appliedmaterials.com.
# # #
Contact:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
*SEM = scanning electron microscope
**DR-SEM = defect review SEM
The Fully-Autonomous Applied SEMVision G5 Defect Review System:
http://hugin.info/143724/R/1568651/487590.jpg
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Source: Applied Materials via Thomson Reuters ONE
[HUG#1568651]
Unternehmensinformation / Kurzprofil:
Datum: 05.12.2011 - 13:31 Uhr
Sprache: Deutsch
News-ID 94000
Anzahl Zeichen: 4351
contact information:
Town:
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Kategorie:
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