Applied Materials Introduces High-Performance ALD Technology for the 3D Era
(Thomson Reuters ONE) -
* Innovative Olympia((TM)) system positions Applied at the forefront of ALD*
technology
* Unique architecture expands portfolio of high-quality ALD films, enables
critical low-temperature processes without compromising productivity
* Systems installed at leading chipmakers for multiple logic and memory device
applications
SANTA CLARA, Calif., July 13, 2015 - Applied Materials, Inc. today unveiled the
Applied Olympia(TM) ALD system featuring a unique, modular architecture that
delivers high-performance ALD technology to manufacturers of leading-edge 3D
memory and logic chips. The 3D device inflection is driving growth in ALD with
demand for new patterning films, new conformal materials and lower thermal
budgets. The Olympia system is well positioned to fulfill these requirements
with uncompromising ALD performance, addressing industry needs with the process
flexibility to precisely engineer and efficiently deposit a variety of low-
temperature, high-quality films for multiple applications.
"Our Olympia system is a major technology innovation for the 3D device
inflection," said Dr. Mukund Srinivasan, vice president and general manager of
Applied's Dielectric Systems and Modules group. "The Olympia system overcomes
fundamental limitations chipmakers are experiencing with conventional ALD
technologies, such as reduced chemistry control of single-wafer solutions and
long cycle times of furnaces. Because of this, we're seeing strong market
response with Olympia systems installed at multiple customers to support their
move to 10nm and beyond."
The Olympia system's adaptable modular architecture enables a uniquely flexible
and rapid process sequence vital for controlling the more complex chemistries
needed to develop the next generation of ALD films. Further, the modular design
creates complete separation of chemistries, eliminating the pump/purge steps of
conventional ALD technologies for improved productivity. The combined advantages
of the Olympia system offer a superior solution to conventional ALD systems and
position the tool for widespread adoption.
Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in materials
engineering solutions for the semiconductor, flat panel display and solar
photovoltaic industries. Our technologies help make innovations like
smartphones, flat screen TVs and solar panels more affordable and accessible to
consumers and businesses around the world. Learn more at
www.appliedmaterials.com.
*ALD=atomic layer deposition
# # #
Contact:
Connie Duncan (editorial/media) 408.563.6209
Michael Sullivan (financial community) 408.986.7977
Applied Olympia? ALD System:
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Datum: 13.07.2015 - 13:31 Uhr
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